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Please use this identifier to cite or link to this item: http://dspace.iitrpr.ac.in:8080/xmlui/handle/123456789/1004
Title: Substrate-Independent epitaxial growth of the metal−organic framework MOF-508a
Authors: Wilson, M.
Barrientos-Palomo, S.N.
Stevens, P.C.
Mitchell, N.L.
Oswald, G.
Nagaraja, C.M.
Badyal, J.P.S.
Keywords: Metal−organic framework (MOF)
Epitaxial growth
Surface functionalization
Plasmachemical deposition
CO2 capture
MOF coating
Issue Date: 13-Nov-2018
Abstract: Plasmachemical deposition is a substrate-independent method for the conformal surface functionalization of solid substrates. Structurally well-defined pulsed plasma deposited poly(1-allylimidazole) layers provide surface imidazole linker groups for the directed liquid-phase epitaxial (layer-by-layer) growth of metal−organic frameworks (MOFs) at room temperature. For the case of microporous [Zn (benzene-1,4- dicarboxylate)-(4,4′-bipyridine)0.5] (MOF-508), the MOF-508a polymorph containing two interpenetrating crystal lattice frameworks undergoes orientated Volmer−Weber growth and displays CO2 gas capture behavior at atmospheric concentrations in proportion to the number of epitaxially grown MOF-508 layers.
URI: http://localhost:8080/xmlui/handle/123456789/1004
Appears in Collections:Year-2018

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