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Results 1-10 of 18 (Search time: 0.002 seconds).
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Issue DateTitleAuthor(s)
9-Mar-2020Effect of annealing parameters and activation top layer on the growth of copper oxide nanowiresChawla, V.; Sardana, N.; Kaur, H.; Kumar, A.; Chandra, R.; Mishra, S.
16-Mar-2020Fractional risk process in insuranceKumar, A.; Leonenko, N.; Pichler, A.
11-Dec-2020Highly efficient visible-light-driven reduction of Cr(VI) from water by porphyrin-based metal– organic frameworks: effect of band gap engineering on the photocatalytic activity†Sharma, N.; Dey, A.K.; Sathe, R.Y.; Kumar, A.; Krishnan, V.; Dhilip Kumar, T.J.; Nagaraja, C.M.
11-Dec-2020Pd-Decorated Magnetic Spinels for Selective Catalytic Reduction of Furfural: Interplay of a Framework-Substituted Transition Metal and Solvent in Selective ReductionKumar, A.; Srivastava, R.
11-Dec-2020Eigenfunctions and genetic algorithm based improved strategies for performance analysis and geometric optimization of a two-zone solar pondKumar, A.; Verma, S.; Das, R.
16-Dec-2020Oxidized graphitic carbon nitride as a sustainable metal-free catalyst for hydrogen transfer reactions under mild conditionsChoudhary, P.; Bahuguna, A.; Kumar, A.; Dhankhar, S.S.; Nagaraja, C.M.; Krishnan, V.
17-Dec-2020Zirconium Phosphate Catalyzed Transformations of Biomass- Derived Furfural to Renewable ChemicalsKumar, A.; Srivastava, R.
8-Jun-2021Skellam type processes of order k and beyondGupta, N.; Kumar, A.; Leonenko, N.
13-Jun-2021Quasielastic scattering measurements in the 28Si + 142,150Nd systemsBiswas, S.; Chakraborty, A.; Jhingan, A.; Arora, D.; Behera, B. R.; Biswas, R.; Deb, N. K.; Ghugre, S. S.; Giri, P. K.; Golda, K. S.; Kaur, G.; Kumar, A.; Kumar, M.; Mukherjee, B.; Nayak, B. K.; Parihari, A.; Rai, N. K.; Rai, S.; Raut, R.; Sahoo, R. N.; Sinha, A. K.
20-Jun-2021A temperature and dielectric roughness-aware matrix rational approximation model for the reliability assessment of Copper– Graphene hybrid On-Chip interconnectsKumar, R.; Kumar, A.; Guglani, S.; Kumar, S.; Roy, S.; Kaushik, B. K.; Sharma, R.; Achar, R.