Dual erosion phases in HNA etched Si surfaces

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DC Field	Value	Language
dc.contributor.author	Dhillon, P. K.	-
dc.contributor.author	Sarkar, S.	-
dc.date.accessioned	2021-10-26T18:55:23Z	-
dc.date.available	2021-10-26T18:55:23Z	-
dc.date.issued	2021-10-27	-
dc.identifier.uri	http://localhost:8080/xmlui/handle/123456789/3145	-
dc.description.abstract	Morphological studies were done on Si (100) surfaces after etching with HNA (HF, HNO3 and CH3COOH) for seven different time intervals till 600s. The resulting morphology was studied using atomic force microscopy (AFM). The images obtained were analyzed using scaling theory. Large number of images from different regions of the same surface were used to find the average behavior of each scaling parameter. The roughness at different length scales was extracted and quantified from AFM measurements. Results indicated two erosion phases of the evolving surface which became evident from power spectral density (PSD) and interface width analysis of the etched surfaces	en_US
dc.language.iso	en_US	en_US
dc.subject	Etching	en_US
dc.subject	atomic force microscopy	en_US
dc.subject	morphology	en_US
dc.title	Dual erosion phases in HNA etched Si surfaces	en_US
dc.type	Article	en_US
Appears in Collections:	Year-2013

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