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dc.contributor.authorKaur, N.-
dc.contributor.authorSharma, S.K.-
dc.contributor.authorKim, D.Y.-
dc.contributor.authorSingh, N.-
dc.date.accessioned2016-11-15T07:02:36Z-
dc.date.available2016-11-15T07:02:36Z-
dc.date.issued2016-11-15-
dc.identifier.urihttp://localhost:8080/xmlui/handle/123456789/335-
dc.description.abstractWe prepared highly transparent yttrium-doped ZnO (YZO) thin films on quartz glass by a sol–gel method, and then annealed them at 600 °C in vacuum. All samples showed hexagonal wurtzite structure with a preferential orientation along the (002) direction. We observed the average grain size of Y: 2 at% thin film to be in the range of 15–20 nm. We observed blue shift in the optical bandgap (3.29 eV→3.32 eV) by increasing the Y concentration (0–2 at%), due to increasing the number of electrons, and replacing the di-valent (Zn2+) with tri-valent (Y3+) dopants. Replacing the higher ionic radii (Y3+) with smaller ionic radii (Zn2+) expanded the local volume of the lattice, which reduced the lattice defects, and increased the intensity ratio of NBE/DLE emission (INBE/IDLE). We also observed the lowest (172 meV) Urbach energy of Y: 2 at% thin film, and confirmed the high structural quality. Incorporation of the appropriate Y concentration (2 at%) improved the crystallinity of YZO thin films, which led to less carrier scattering and lower resistivity.en_US
dc.language.isoen_USen_US
dc.subjectYZO thin filmsen_US
dc.subjectYttrium dopant concentrationen_US
dc.subjectAnnealing temperatureen_US
dc.subjectMicrostructureen_US
dc.subjectStructuralen_US
dc.subjectOptical and electrical propertiesen_US
dc.titleHighly transparent and lower resistivity of yttrium doped ZnO thin films grown on quartz glass by sol–gel methoden_US
dc.typeArticleen_US
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