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dc.contributor.authorNishad, A.K.
dc.contributor.authorSharma, R.
dc.date.accessioned2016-11-19T05:27:34Z
dc.date.available2016-11-19T05:27:34Z
dc.date.issued2016-11-19
dc.identifier.urihttp://localhost:8080/xmlui/handle/123456789/468
dc.description.abstractIn this paper, As F5-intercalated multilayer graphene nanoribbons (MLGNRs) as a potential interconnect candidate for future technology nodes is investigated. This paper for the first time analyzes impact of As F5 intercalation on effective resistance of top contact MLGNR (TC-MLGNRs) interconnects. Performance metrics such as delay, energy delay product and bandwidth density of As F5-intercalated TC-MLGNRs for local/intermediate and global interconnects are analyzed and compared with that of neutral TC-MLGNRs as well as traditional copper (Cu) interconnects. Our analysis shows that for similar dimensions, As F5-intercalated TC-MLGNR interconnects can provide better performance than Cu wires for both local/intermediate and global interconnect applications. For 1 mm interconnect length, As F5-intercalated TC-MLGNRs offer significant improvement in delay, energy budget and BWD as compared to Cu wires for local/intermediate and global interconnects, thereby making it a promising candidate for future interconnect technologies.en_US
dc.language.isoen_USen_US
dc.subjectAsF5-intercalationen_US
dc.subjectBandwidth densityen_US
dc.subjectDelayen_US
dc.subjectEnergyen_US
dc.subjectInterconnectsen_US
dc.subjectMLGNRsen_US
dc.subjectTop-contacten_US
dc.titlePerformance analysis of AsF5-intercalated top- contact multiLayer graphene nano ribbon interconnectsen_US
dc.typeArticleen_US
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