Substrate-Independent epitaxial growth of the metal−organic framework MOF-508a

Mitchell, N.L.; Stevens, P.C.; Badyal, J.P.S.; Nagaraja, C.M.; Oswald, G.; Barrientos-Palomo, S.N.; Wilson, M.

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dc.contributor.author	Wilson, M.
dc.contributor.author	Barrientos-Palomo, S.N.
dc.contributor.author	Stevens, P.C.
dc.contributor.author	Mitchell, N.L.
dc.contributor.author	Oswald, G.
dc.contributor.author	Nagaraja, C.M.
dc.contributor.author	Badyal, J.P.S.
dc.date.accessioned	2018-11-13T05:26:54Z
dc.date.available	2018-11-13T05:26:54Z
dc.date.issued	2018-11-13
dc.identifier.uri	http://localhost:8080/xmlui/handle/123456789/1004
dc.description.abstract	Plasmachemical deposition is a substrate-independent method for the conformal surface functionalization of solid substrates. Structurally well-defined pulsed plasma deposited poly(1-allylimidazole) layers provide surface imidazole linker groups for the directed liquid-phase epitaxial (layer-by-layer) growth of metal−organic frameworks (MOFs) at room temperature. For the case of microporous [Zn (benzene-1,4- dicarboxylate)-(4,4′-bipyridine)0.5] (MOF-508), the MOF-508a polymorph containing two interpenetrating crystal lattice frameworks undergoes orientated Volmer−Weber growth and displays CO2 gas capture behavior at atmospheric concentrations in proportion to the number of epitaxially grown MOF-508 layers.	en_US
dc.language.iso	en_US	en_US
dc.subject	Metal−organic framework (MOF)	en_US
dc.subject	Epitaxial growth	en_US
dc.subject	Surface functionalization	en_US
dc.subject	Plasmachemical deposition	en_US
dc.subject	CO2 capture	en_US
dc.subject	MOF coating	en_US
dc.title	Substrate-Independent epitaxial growth of the metal−organic framework MOF-508a	en_US
dc.type	Article	en_US