Abstract:
Near perfect absorbers find application in many areas including solar cells, energy harvesting and antireflection coatings for space applications. Here we report the use of optical gradation concept to fabricate a near perfect absorber on etched Si wafer. As a proof of concept, 99.4% absorption is achieved in the broad range of 300 nm to 2000 nm. Moreover, absorption capacity of optically graded surface remains higher than 99% up to beam incident angle of 50°. While carbon nanotubes (index ~1.1) are used as top layer, subsequent layers with increasing optical index across the thickness are chosen so as to satisfy zero reflection condition on multilayered assembly. Inward bending of incident beam and total internal reflection of reflected beam caused due to optical index gradient contributes to absorb the incident beam more efficiently. In addition, multiple scattering of incident beam due to the presence of multiscale feature size in graded assembly helps to absorb shorter as well as longer wavelengths of incident light. The graded assembly shows contact angle of 160° with roll-off angle equal to 5° implying that the graded absorber is not only super black but also superhydrophobic and self-cleaning in nature. The combination of properties shown by the super absorber makes it very attractive, especially for next generation solar cells to harness energy in the wavelength range of 1000 nm to 2000 nm.
