Nanostructuring at elevated temperatures on ion irradiated coSi binary mixture

dc.contributor.author	Parida, B. K.
dc.contributor.author	Sarkar, S.
dc.date.accessioned	2021-06-08T18:45:31Z
dc.date.available	2021-06-08T18:45:31Z
dc.date.issued	2021-06-09
dc.identifier.uri	http://localhost:8080/xmlui/handle/123456789/1772
dc.description.abstract	Nanostructure formation at low energy ion beam sputtering on binary surface varying the substrate temperature has been studied. The surface has been irradiated with Ar+ ion at 700 eV and a fluence of 1.4× 1018 ions.cm-2. Co69Si31 surfaces have shown peculiar nanoscale semi-ellipsoidal structures for different surface temperatures (100o -400o C) at an angle incidence of 67o . A periodicity is appeared for comparatively higher temperature perpendicular to ion beam direction. The root mean square (rms) roughness variation has been summarized. Ion beam polishing effect and the thermal diffusion play crucial role in the pattern evolution.	en_US
dc.language.iso	en_US	en_US
dc.title	Nanostructuring at elevated temperatures on ion irradiated coSi binary mixture	en_US
dc.type	Article	en_US