Abstract:
Atomic design of a 2D-material such as graphene can be substantially influenced by etching, deliberately induced in a transmission electron microscope.
It is achieved primarily by overcoming the threshold energy for defect formation by controlling the kinetic energy and current density of the fast electrons.
Recent studies have demonstrated that the presence of certain species of
atoms can catalyze atomic bond dissociation processes under the electron
beam by reducing their threshold energy. Most of the reported catalytic atom
species are single atoms, which have strong interaction with single-layer
graphene (SLG). Yet, no such behavior has been reported for molecular species. This work shows by experimentally comparing the interaction of alkali
and halide species separately and conjointly with SLG, that in the presence
of electron irradiation, etching of SLG is drastically enhanced by the simultaneous presence of alkali and iodine atoms. Density functional theory and
first principles molecular dynamics calculations reveal that due to chargetransfer phenomena the CC bonds weaken close to the alkali-iodide species,
which increases the carbon displacement cross-section. This study ascribes
pronounced etching activity observed in SLG to the catalytic behavior of the
alkali-iodide species in the presence of electron irradiation