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Highly transparent and lower resistivity of yttrium doped ZnO thin films grown on quartz glass by sol–gel method

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dc.contributor.author Kaur, N.
dc.contributor.author Sharma, S.K.
dc.contributor.author Kim, D.Y.
dc.contributor.author Singh, N.
dc.date.accessioned 2016-11-15T07:02:36Z
dc.date.available 2016-11-15T07:02:36Z
dc.date.issued 2016-11-15
dc.identifier.uri http://localhost:8080/xmlui/handle/123456789/335
dc.description.abstract We prepared highly transparent yttrium-doped ZnO (YZO) thin films on quartz glass by a sol–gel method, and then annealed them at 600 °C in vacuum. All samples showed hexagonal wurtzite structure with a preferential orientation along the (002) direction. We observed the average grain size of Y: 2 at% thin film to be in the range of 15–20 nm. We observed blue shift in the optical bandgap (3.29 eV→3.32 eV) by increasing the Y concentration (0–2 at%), due to increasing the number of electrons, and replacing the di-valent (Zn2+) with tri-valent (Y3+) dopants. Replacing the higher ionic radii (Y3+) with smaller ionic radii (Zn2+) expanded the local volume of the lattice, which reduced the lattice defects, and increased the intensity ratio of NBE/DLE emission (INBE/IDLE). We also observed the lowest (172 meV) Urbach energy of Y: 2 at% thin film, and confirmed the high structural quality. Incorporation of the appropriate Y concentration (2 at%) improved the crystallinity of YZO thin films, which led to less carrier scattering and lower resistivity. en_US
dc.language.iso en_US en_US
dc.subject YZO thin films en_US
dc.subject Yttrium dopant concentration en_US
dc.subject Annealing temperature en_US
dc.subject Microstructure en_US
dc.subject Structural en_US
dc.subject Optical and electrical properties en_US
dc.title Highly transparent and lower resistivity of yttrium doped ZnO thin films grown on quartz glass by sol–gel method en_US
dc.type Article en_US


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